Description
IX ALITE HPR4800 CL Strong Base Anion Exchange Resin | High Performance for Condensate Polishing & Ultrapure Water
Product Overview
IX ALITE HPR4800 CL is a premium-grade, uniform-particle strong base Type I anion exchange resin, specifically engineered for high-performance applications in power generation, industrial ultrapure water production, and other demanding water treatment systems. Particularly effective in condensate polishing and high-purity mixed bed applications, it delivers exceptional removal of anions, silica, and organic acids. Originally developed as part of the trusted DOWEX™ product line, it combines advanced polymer technology with optimized bead design for superior performance in challenging operating environments.
Key Features
• Uniform Particle Size Technology: Narrow bead distribution ensures consistent flow patterns, lower pressure drop, and enhanced kinetic performance compared to conventional resins
• High Exchange Capacity: Provides excellent total and operating capacity, resulting in extended service cycles and reduced regeneration frequency
• Superior Silica & CO2 Removal: Specifically designed for effective removal of weakly ionized acids, including silica and carbonic acid
• Enhanced Physical Stability: Exceptional resistance to osmotic shock, thermal degradation, and mechanical attrition ensures longer service life
• Low Leachable Content: Minimizes organic and ionic leachables to maintain high-purity effluent quality
• Type I Functional Groups: Provides strong base characteristics with high affinity for all anions, even under varying pH conditions
Technical Specifications
|
Parameter
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Specification
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|---|---|
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Resin Type
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Strong Base Type I Anion Exchange Resin
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|
Matrix
|
Styrene-DVB Gel
|
|
Functional Group
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Quaternary Ammonium (-N⁺(CH₃)₃)
|
|
Ionic Form (as shipped)
|
Cl⁻ (Chloride)
|
|
Total Exchange Capacity
|
≥1.4 eq/L (min.)
|
|
Particle Size Range
|
0.60-0.75 mm
|
|
Uniformity Coefficient
|
≤1.2
|
|
Moisture Content
|
55-65%
|
|
Maximum Operating Temperature
|
60°C (Cl⁻ form)
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|
Reversible Swelling (Cl⁻ → OH⁻)
|
Approx. 20%
|
|
Shipping Weight
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Approx. 700-750 g/L
|
Target Impurity Removal
• Silica (SiO₂) – Typically to <5 ppb levels
• Carbon Dioxide (as CO₂/HCO₃⁻/CO₃²⁻) – Effective removal in decarbonation applications
• Sulfates, Chlorides, Nitrates – High affinity removal
• Organic Acids – Efficient removal of low molecular weight organic anions
• Boron – When operated in OH⁻ form at elevated pH
Typical Applications
• Condensate Polishing – Primary anion resin in mixed bed or separate bed condensate polishing units in nuclear and fossil fuel power plants
• Ultrapure Water Production – Key component in mixed bed polishing for semiconductor, microelectronics, and pharmaceutical water systems
• Industrial Demineralization – Anion unit in two-bed deionization systems for high-purity process water
• Wastewater Treatment – Removal of anions in specific industrial wastewater streams
• Chemical Processing – Catalyst recovery and specific anion removal applications
System Design & Operating Guidelines
- Pretreatment Requirements – Feedwater should be free of oxidants (chlorine, ozone) and have low suspended solids to prevent fouling
- Service Flow Rates – 10-40 BV/h depending on water quality and system configuration
- Regeneration Protocol – Typically regenerated with 4-6% NaOH at elevated temperatures (35-40°C) for optimal silica removal efficiency
- Rinse Requirements – Thorough rinsing with high-quality water to remove residual regenerant
- Performance Monitoring – Track effluent silica, conductivity, and pH to determine exhaustion
Comparison with Conventional Anion Resins
→ Faster Kinetics: Uniform particle size reduces diffusion limitations, improving exchange rates
→ Higher Capacity: Up to 15-20% greater operating capacity than standard anion resins
→ Better Silica Removal: Optimized for efficient weakly ionized acid removal
→ Longer Lifespan: Enhanced physical and chemical stability reduces bead breakage
→ Lower Operating Costs: Combines higher capacity with more efficient regeneration
Special Considerations for Condensate Polishing
• Oxygenated Water Compatibility: Suitable for use in oxygenated condensate systems
• High Temperature Tolerance: Maintains performance in elevated temperature applications
• Low Leachable Design: Minimizes contamination of high-purity steam-water cycles
• Mixed Bed Applications: When used in mixed beds with cation resin, provides excellent separation characteristics
Packaging & Quality Assurance
• Standard packaging: 25-liter sealed, polyethylene-lined fiber drums
• Each batch supplied with Certificate of Analysis (CoA) confirming key specifications
• Manufacturing follows stringent quality control procedures
• Resin shipped in Cl⁻ form for extended shelf life and stability
Why Choose IX ALITE HPR4800 CL?
For engineers and plant operators requiring reliable, high-performance anion exchange capacity in demanding applications, IX ALITE HPR4800 CL delivers proven results. Its combination of uniform particle technology, high capacity, and physical durability makes it ideal for critical applications where water purity directly impacts process efficiency, product quality, and equipment protection. When standard anion resins cannot meet performance requirements, HPR4800 CL provides the technological edge needed for superior water treatment.
Important Note
System design, resin volume calculations, and operating parameters should be based on specific feedwater analysis and treated water requirements. Always consult the latest product data sheet and safety documentation before use. Actual performance may vary based on operating conditions and system configuration.




