Dow MR-3UPW is a premium-grade, high-purity mixed bed ion exchange resin specifically engineered for the final polishing stage in ultra-pure water (UPW) production systems. It is the solution of choice for semiconductor, microelectronics, pharmaceutical, and power generation industries where the absolute lowest levels of ionic and organic contaminants are non-negotiable. This resin delivers the extreme water quality (often exceeding 18.2 MΩ·cm resistivity) required for critical manufacturing processes.

• Ultra-Low Leachables: Exceptionally low TOC (Total Organic Carbon) and ionic leachables prevent downstream contamination, protecting sensitive processes.

• Exceptional Kinetic Performance: Optimized bead size distribution ensures fast ion exchange kinetics for superior polishing efficiency at high flow rates.

• Nuclear-Grade Purity Standards: Manufactured under cleanroom conditions with raw materials and processes that meet or exceed stringent standards for electronic and nuclear applications.

• High Operational Capacity: Provides long service cycles, reducing regeneration frequency and operational downtime.

• Proven Reliability: Trusted in the world’s most advanced semiconductor fabrication plants (fabs) for consistent, batch-to-batch performance.

• Cationic Impurities (Na⁺, K⁺, etc.): < 5 ppb

• Anionic Impurities (Cl⁻, SO₄²⁻): < 5 ppb

• Total Organic Carbon (TOC) Leachable: < 10 ppb

• Silica Leachable (as SiO₂): < 5 ppb

• Semiconductor & Microelectronics: Final UPW polishing for wafer cleaning, etching, and chemical mechanical planarization (CMP).

• Pharmaceutical & Biotech: Water for Injection (WFI) polishing and critical process water for biologics production.

• High-Purity Power: Condensate polishing in ultra-supercritical and nuclear power plant secondary circuits.

• Advanced Research: Analytical laboratory water systems, LC-MS, and other sensitive instrumentation.

• Pretreatment is Critical: MR-3UPW is a polishing resin. It requires high-quality feed water (typically from a primary RO+EDI or two-pass RO system).

• Recommended Service Flow Rate: 20 – 50 BV/h for optimal polishing performance.

• Vessel Design: Use in separate cation/anion vessels or as a mixed bed. For mixed beds, a cation-to-anion volume ratio of approximately 40:60 is standard.

• Monitoring: Effluent should be continuously monitored for resistivity (>17.5 MΩ·cm), TOC (<5 ppb), and specific ions (Na⁺, Cl⁻, SiO₂).

1. Handling: Must be handled using ultra-pure water and under clean conditions to prevent contamination. Use dedicated, ultra-clean transfer equipment.

2. Regeneration: Requires ultra-pure regenerants (electronic-grade acids and bases) and a validated, rigorous regeneration procedure, often performed off-site by specialized service providers.

3. Exhaustion Indicators: A rise in ionic leakage or a drop in effluent resistivity signals the need for regeneration or replacement.

• Packaging: Sealed, laminated bags within clean, sealed drums or specially designed disposable liners to prevent contamination.

• Certification: Each batch is supplied with a comprehensive Certificate of Analysis (CoA) detailing key performance and purity parameters.

• Traceability: Full batch traceability from raw materials to final product.

When your process demands water at the purity frontier, settling for anything less than the benchmark is not an option. Dow MR-3UPW is engineered for applications where a single part-per-billion of impurity can compromise yield, quality, and reliability. It represents the culmination of Dow’s expertise in ion exchange, providing the certainty needed for the most critical water purification challenges.

This information is for guidance purposes. System design, resin sizing, and operating protocols must be developed by qualified engineers based on specific feed water analysis and product water requirements. Always consult the official product data sheet and safety documentation prior to use. Specifications are subject to change; please confirm with the current technical documentation.